Device for jetting gas and solar cell manufacturing method using the same

A device for disposing a gas, the device including: a chamber; a plurality of gas jetting plates disposed in the chamber, each gas jetting plate of the plurality of gas jetting plates including a plurality of gas jetting holes disposed on a surface thereof; and a gas pipe fluidly connected to the ga...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	JUN GUG-IL, KIM IN-KI
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	A device for disposing a gas, the device including: a chamber; a plurality of gas jetting plates disposed in the chamber, each gas jetting plate of the plurality of gas jetting plates including a plurality of gas jetting holes disposed on a surface thereof; and a gas pipe fluidly connected to the gas jetting plate and extending outside the chamber, wherein each gas jetting plate includes a first stage, which is fluidly connected to the gas pipe, and a final stage, which includes the plurality of gas jetting holes.