Method of dividing a semiconductor wafer having semiconductor and metal layers into separate devices

A method of dividing a semiconductor wafer having a metal layer includes removing all or substantially all of the semiconductor material in scribe streets while the wafer is supported by a support, turning over the wafer and while using a second support to support the wafer, introducing a heat energ...

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Bibliographische Detailangaben
1. Verfasser: LINDSEY, JR. PAUL C
Format: Patent
Sprache:eng
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Zusammenfassung:A method of dividing a semiconductor wafer having a metal layer includes removing all or substantially all of the semiconductor material in scribe streets while the wafer is supported by a support, turning over the wafer and while using a second support to support the wafer, introducing a heat energy flux into the metal layer to remove metal of the metal layer from the scribe streets.