Automated generation of oxide pillar slot shapes in silicon-on-insulator formation technology

A method of automated generation of oxide pillar (PX) slot shapes of a PX layer within silicon-on-insulator (SOI) structures that includes generating a placement grid on recess oxide (RX) shapes, creating PX placement markers on the placement grid along a perimeter of the RX shapes, filtering the PX...

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Bibliographische Detailangaben
Hauptverfasser:	TESSIER AMANDA L, HULVEY MICHAEL D, KUMAR AMIT, SUCHARITAVES JEANNE-TANIA, HENSEN WILLIAM K
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CALCULATING CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION ORPROCESSING OF GOODS COMPUTING COUNTING ELECTRIC DIGITAL DATA PROCESSING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS PHYSICS SEMICONDUCTOR DEVICES TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINSTCLIMATE CHANGE
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Beschreibung
Zusammenfassung:	A method of automated generation of oxide pillar (PX) slot shapes of a PX layer within silicon-on-insulator (SOI) structures that includes generating a placement grid on recess oxide (RX) shapes, creating PX placement markers on the placement grid along a perimeter of the RX shapes, filtering the PX placement markers, generating a PX slot shape corresponding to each filtered PX placement marker on the RX shapes, correcting location errors associated with the generated PX slot shapes, generating PX slot shapes on RX shapes of a predetermined size for which PX slot shapes were not generated, performing a verification operation of the PX slot shapes, and outputting the PX layer including the verified PX slot shapes.