Inverse mask design and correction for electronic design

Various implementations of the invention provide for the generation of "smooth" mask contours by inverse mask transmission derivation and by subsequently "smoothing" the derived mask contours by proximity correction.

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Bibliographische Detailangaben
1. Verfasser:	GRANIK YURI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CALCULATING CINEMATOGRAPHY COMPUTING COUNTING ELECTRIC DIGITAL DATA PROCESSING ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	Various implementations of the invention provide for the generation of "smooth" mask contours by inverse mask transmission derivation and by subsequently "smoothing" the derived mask contours by proximity correction.