Techniques providing fiducial markers for failure analysis

A semiconductor die includes a group of spacer cells within the semiconductor die. The spacer cells include fiducial markings therein. The fiducial markings can be located within a metal layer, a diffusion layer, a polysilicon layer, and/or a Shallow Trench Isolation (STI) structure.

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Bibliographische Detailangaben
Hauptverfasser: VANG FOUA, LYONS DONALD D, LAISNE MICHAEL, PAN XIANGDONG, PATEL PRAYAG B, VILLAFANA MARTIN
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:A semiconductor die includes a group of spacer cells within the semiconductor die. The spacer cells include fiducial markings therein. The fiducial markings can be located within a metal layer, a diffusion layer, a polysilicon layer, and/or a Shallow Trench Isolation (STI) structure.