System and method for removing contaminants

The invention provides a system and method comprising an apparatus for removing contaminants from a gas in a semiconductor processing device, which can include a filter unit having at least two parallel filter stages located therein. The filter stages are designed to remove a least a portion of the...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	KISHKOVICH OLEG P, GOODWIN WILLIAM, SERGI JOHN E, GAUDREAU JOHN, KINKEAD DEVON A
Format:	Patent
Sprache:	eng
Schlagworte:	PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SEPARATION TRANSPORTING
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	The invention provides a system and method comprising an apparatus for removing contaminants from a gas in a semiconductor processing device, which can include a filter unit having at least two parallel filter stages located therein. The filter stages are designed to remove a least a portion of the contaminants present in the gas flowing through them. The apparatus can also include a flow controller for distributing the gas flow among the filter stages. In one embodiment, the controller may consist of a diffuser plate. The invention also provides a sampling tube orifice for gas flow control in a system or method of the invention. In another embodiment, an apparatus for removing contaminants from a gas in a clean room comprises a filter unit having at least two parallel filter stages, which are used to remove a portion of the contaminants in the gas as it passes through the apparatus.