Spectral purity filters for use in a lithographic apparatus
According to an aspect of the present invention, a spectral purity filter includes an aperture, the aperture being arranged to diffract a first wavelength of radiation and to allow at least a portion of a second wavelength of radiation to be transmitted through the aperture, the second wavelength of...
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| creator | SOER WOUTER ANTHON BANINE VADIM YEVGENYEVICH JAK MARTIN JACOBUS JOHAN VAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS YAKUNIN ANDREY MIKHAILOVICH |
| description | According to an aspect of the present invention, a spectral purity filter includes an aperture, the aperture being arranged to diffract a first wavelength of radiation and to allow at least a portion of a second wavelength of radiation to be transmitted through the aperture, the second wavelength of radiation being shorter than the first wavelength of radiation, wherein the aperture has a diameter greater than 20 μm. |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US8390788B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US8390788B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US8390788B23</originalsourceid><addsrcrecordid>eNqNyrEKwkAMANBbHET9h_yAIHbwxK3S4l6dSzhyNnD0QpIb_HsXP8DpLW8bbpNQcsUC0pT9A5mLkxrkqtCMgFdAKOxLfSvKwglQBBW92T5sMhajw89dgHF43h9HkjqTCSZayefXFLvr6RJjf-7-KF9zjy-J</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Spectral purity filters for use in a lithographic apparatus</title><source>esp@cenet</source><creator>SOER WOUTER ANTHON ; BANINE VADIM YEVGENYEVICH ; JAK MARTIN JACOBUS JOHAN ; VAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS ; YAKUNIN ANDREY MIKHAILOVICH</creator><creatorcontrib>SOER WOUTER ANTHON ; BANINE VADIM YEVGENYEVICH ; JAK MARTIN JACOBUS JOHAN ; VAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS ; YAKUNIN ANDREY MIKHAILOVICH</creatorcontrib><description>According to an aspect of the present invention, a spectral purity filter includes an aperture, the aperture being arranged to diffract a first wavelength of radiation and to allow at least a portion of a second wavelength of radiation to be transmitted through the aperture, the second wavelength of radiation being shorter than the first wavelength of radiation, wherein the aperture has a diameter greater than 20 μm.</description><language>eng</language><subject>ACCESSORIES THEREFOR ; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES ; APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM ; APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; GAMMA RAY OR X-RAY MICROSCOPES ; HOLOGRAPHY ; IRRADIATION DEVICES ; MATERIALS THEREFOR ; NUCLEAR ENGINEERING ; NUCLEAR PHYSICS ; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICS ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR</subject><creationdate>2013</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20130305&DB=EPODOC&CC=US&NR=8390788B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76294</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20130305&DB=EPODOC&CC=US&NR=8390788B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SOER WOUTER ANTHON</creatorcontrib><creatorcontrib>BANINE VADIM YEVGENYEVICH</creatorcontrib><creatorcontrib>JAK MARTIN JACOBUS JOHAN</creatorcontrib><creatorcontrib>VAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS</creatorcontrib><creatorcontrib>YAKUNIN ANDREY MIKHAILOVICH</creatorcontrib><title>Spectral purity filters for use in a lithographic apparatus</title><description>According to an aspect of the present invention, a spectral purity filter includes an aperture, the aperture being arranged to diffract a first wavelength of radiation and to allow at least a portion of a second wavelength of radiation to be transmitted through the aperture, the second wavelength of radiation being shorter than the first wavelength of radiation, wherein the aperture has a diameter greater than 20 μm.</description><subject>ACCESSORIES THEREFOR</subject><subject>APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES</subject><subject>APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM</subject><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>GAMMA RAY OR X-RAY MICROSCOPES</subject><subject>HOLOGRAPHY</subject><subject>IRRADIATION DEVICES</subject><subject>MATERIALS THEREFOR</subject><subject>NUCLEAR ENGINEERING</subject><subject>NUCLEAR PHYSICS</subject><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICS</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2013</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNyrEKwkAMANBbHET9h_yAIHbwxK3S4l6dSzhyNnD0QpIb_HsXP8DpLW8bbpNQcsUC0pT9A5mLkxrkqtCMgFdAKOxLfSvKwglQBBW92T5sMhajw89dgHF43h9HkjqTCSZayefXFLvr6RJjf-7-KF9zjy-J</recordid><startdate>20130305</startdate><enddate>20130305</enddate><creator>SOER WOUTER ANTHON</creator><creator>BANINE VADIM YEVGENYEVICH</creator><creator>JAK MARTIN JACOBUS JOHAN</creator><creator>VAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS</creator><creator>YAKUNIN ANDREY MIKHAILOVICH</creator><scope>EVB</scope></search><sort><creationdate>20130305</creationdate><title>Spectral purity filters for use in a lithographic apparatus</title><author>SOER WOUTER ANTHON ; BANINE VADIM YEVGENYEVICH ; JAK MARTIN JACOBUS JOHAN ; VAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS ; YAKUNIN ANDREY MIKHAILOVICH</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US8390788B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2013</creationdate><topic>ACCESSORIES THEREFOR</topic><topic>APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES</topic><topic>APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM</topic><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>GAMMA RAY OR X-RAY MICROSCOPES</topic><topic>HOLOGRAPHY</topic><topic>IRRADIATION DEVICES</topic><topic>MATERIALS THEREFOR</topic><topic>NUCLEAR ENGINEERING</topic><topic>NUCLEAR PHYSICS</topic><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICS</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR</topic><toplevel>online_resources</toplevel><creatorcontrib>SOER WOUTER ANTHON</creatorcontrib><creatorcontrib>BANINE VADIM YEVGENYEVICH</creatorcontrib><creatorcontrib>JAK MARTIN JACOBUS JOHAN</creatorcontrib><creatorcontrib>VAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS</creatorcontrib><creatorcontrib>YAKUNIN ANDREY MIKHAILOVICH</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SOER WOUTER ANTHON</au><au>BANINE VADIM YEVGENYEVICH</au><au>JAK MARTIN JACOBUS JOHAN</au><au>VAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS</au><au>YAKUNIN ANDREY MIKHAILOVICH</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Spectral purity filters for use in a lithographic apparatus</title><date>2013-03-05</date><risdate>2013</risdate><abstract>According to an aspect of the present invention, a spectral purity filter includes an aperture, the aperture being arranged to diffract a first wavelength of radiation and to allow at least a portion of a second wavelength of radiation to be transmitted through the aperture, the second wavelength of radiation being shorter than the first wavelength of radiation, wherein the aperture has a diameter greater than 20 μm.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY GAMMA RAY OR X-RAY MICROSCOPES HOLOGRAPHY IRRADIATION DEVICES MATERIALS THEREFOR NUCLEAR ENGINEERING NUCLEAR PHYSICS OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR |
| title | Spectral purity filters for use in a lithographic apparatus |
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