Spectral purity filters for use in a lithographic apparatus

According to an aspect of the present invention, a spectral purity filter includes an aperture, the aperture being arranged to diffract a first wavelength of radiation and to allow at least a portion of a second wavelength of radiation to be transmitted through the aperture, the second wavelength of...

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Bibliographische Detailangaben
Hauptverfasser: SOER WOUTER ANTHON, BANINE VADIM YEVGENYEVICH, JAK MARTIN JACOBUS JOHAN, VAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS, YAKUNIN ANDREY MIKHAILOVICH
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:According to an aspect of the present invention, a spectral purity filter includes an aperture, the aperture being arranged to diffract a first wavelength of radiation and to allow at least a portion of a second wavelength of radiation to be transmitted through the aperture, the second wavelength of radiation being shorter than the first wavelength of radiation, wherein the aperture has a diameter greater than 20 μm.