Method for calibrating a pyrometer, method for determining the temperature of a semiconducting wafer and system for determining the temperature of a semiconducting wafer

Method for calibrating a pyrometer, method for determining the temperature of a semiconducting wafer and system for determining the temperature of a semiconducting wafer

A method for calibrating a pyrometer a temperature of a calibration sample is determined from the ratio of a first reflectance and a second reflectance and the pyrometer is calibrated by assigning the determined temperature of the calibration sample with a thermal radiation signal measured by the py...

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Bibliographische Detailangaben
Hauptverfasser: SCHENK TOBIAS, HENNINGER BERND, UREDAT STEFFEN, BINETTI MARCELLO, ZILIAN JENS, ZETTLER JOERG-THOMAS, HABERLAND KOLJA
Format: Patent
Sprache:eng
Schlagworte:
MEASURING
MEASURING QUANTITY OF HEAT
MEASURING TEMPERATURE
PHYSICS
TESTING
THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR
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Beschreibung
Zusammenfassung:A method for calibrating a pyrometer a temperature of a calibration sample is determined from the ratio of a first reflectance and a second reflectance and the pyrometer is calibrated by assigning the determined temperature of the calibration sample with a thermal radiation signal measured by the pyrometer.