Method of manufacturing a semiconductor chip including a semiconductor substrate and a through via provided in a through hole

A semiconductor chip includes a semiconductor substrate, a through via provided in a through hole that passes through the semiconductor substrate, insulating layers laminated on the semiconductor substrate, a multi-layered wiring structure having a first wiring pattern and a second wiring pattern, a...

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Bibliographische Detailangaben
Hauptverfasser: MURAYAMA KEI, HIGASHI MITSUTOSHI
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A semiconductor chip includes a semiconductor substrate, a through via provided in a through hole that passes through the semiconductor substrate, insulating layers laminated on the semiconductor substrate, a multi-layered wiring structure having a first wiring pattern and a second wiring pattern, and an external connection terminal provided on an uppermost layer of the multi-layered wiring structure, wherein the through via and the external connection terminal are connected electrically by the second wiring pattern.