Integrated circuit arrangement including vias having two sections, and method for producing the same

An integrated circuit arrangement containing a via is disclosed. The via has an upper section having greatly inclined sidewalls. A lower section of the via has approximately vertical sidewalls. In one embodiment, a liner layer is used as a hard mask in the production of the via and defines the posit...

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Bibliographische Detailangaben
Hauptverfasser: KRIZ JAKOB, GOLLER KLAUS
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:An integrated circuit arrangement containing a via is disclosed. The via has an upper section having greatly inclined sidewalls. A lower section of the via has approximately vertical sidewalls. In one embodiment, a liner layer is used as a hard mask in the production of the via and defines the position of the sections of the via.