Device and method for preparing relief printing form

A relief printing form is prepared from a photosensitive element in an environment having controlled oxygen concentration during exposure to actinic radiation. An in situ mask is formed on a photosensitive element, the element is exposed to actinic radiation through the in-situ mask in an environmen...

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Bibliographische Detailangaben
Hauptverfasser:	PERROTTO JOSEPH ANTHONY, PATEL DHIREN V, MCMILLEN ROBERT A, RUDOLPH MICHAEL LEE
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR AUXILIARY PROCESSES IN PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES PHYSICS
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Beschreibung
Zusammenfassung:	A relief printing form is prepared from a photosensitive element in an environment having controlled oxygen concentration during exposure to actinic radiation. An in situ mask is formed on a photosensitive element, the element is exposed to actinic radiation through the in-situ mask in an environment having an inert gas and a concentration of oxygen between 190,000 and 100 ppm, and the exposed element is treated to form the relief printing form having a pattern of raised surface areas.