Self-aligned stylus with high-sphericity and method of manufacturing the same
A method of manufacturing a self-aligned stylus with high sphericity includes the steps of: forming a polymeric layer on a substrate; placing a sphere on the polymeric layer; softening the polymeric layer to make a portion of the sphere sink into the polymeric layer; forming a specific light absorbi...
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creator | SHIH PO-JEN SHIH WEN-PIN WU MING-DAO CHANG DUO-RU TSAO LII TSAI YAOUAN |
description | A method of manufacturing a self-aligned stylus with high sphericity includes the steps of: forming a polymeric layer on a substrate; placing a sphere on the polymeric layer; softening the polymeric layer to make a portion of the sphere sink into the polymeric layer; forming a specific light absorbing layer on the polymeric layer; illuminating the sphere and the specific light absorbing layer with specific light such that the specific light is focused by the sphere to expose the polymeric layer to form an exposed portion and an unexposed portion; removing the specific light absorbing layer; and baking the polymeric layer and then removing the unexposed portion. A self-aligned stylus with high sphericity is also disclosed. |
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fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US8240057B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US8240057B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US8240057B23</originalsourceid><addsrcrecordid>eNqNyjsKAjEQANA0FqLeYS4QWFZFa0WxsVqtlyGZ7ATyYzNB9vY2HsDqNW-tngMFpzH4KZGFKktoFT5eGNhPrGthmr3xsgAmC5GEs4XsIGJqDo202acJhAkqRtqqlcNQafdzo-B-e10fmkoeqRY0lEjG93DuD113PF36_R_lC4M7Ngo</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Self-aligned stylus with high-sphericity and method of manufacturing the same</title><source>esp@cenet</source><creator>SHIH PO-JEN ; SHIH WEN-PIN ; WU MING-DAO ; CHANG DUO-RU ; TSAO LII ; TSAI YAOUAN</creator><creatorcontrib>SHIH PO-JEN ; SHIH WEN-PIN ; WU MING-DAO ; CHANG DUO-RU ; TSAO LII ; TSAI YAOUAN</creatorcontrib><description>A method of manufacturing a self-aligned stylus with high sphericity includes the steps of: forming a polymeric layer on a substrate; placing a sphere on the polymeric layer; softening the polymeric layer to make a portion of the sphere sink into the polymeric layer; forming a specific light absorbing layer on the polymeric layer; illuminating the sphere and the specific light absorbing layer with specific light such that the specific light is focused by the sphere to expose the polymeric layer to form an exposed portion and an unexposed portion; removing the specific light absorbing layer; and baking the polymeric layer and then removing the unexposed portion. A self-aligned stylus with high sphericity is also disclosed.</description><language>eng</language><subject>MEASURING ; MEASURING ANGLES ; MEASURING AREAS ; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS ; MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS ; PHYSICS ; TESTING</subject><creationdate>2012</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20120814&DB=EPODOC&CC=US&NR=8240057B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,778,883,25547,76298</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20120814&DB=EPODOC&CC=US&NR=8240057B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SHIH PO-JEN</creatorcontrib><creatorcontrib>SHIH WEN-PIN</creatorcontrib><creatorcontrib>WU MING-DAO</creatorcontrib><creatorcontrib>CHANG DUO-RU</creatorcontrib><creatorcontrib>TSAO LII</creatorcontrib><creatorcontrib>TSAI YAOUAN</creatorcontrib><title>Self-aligned stylus with high-sphericity and method of manufacturing the same</title><description>A method of manufacturing a self-aligned stylus with high sphericity includes the steps of: forming a polymeric layer on a substrate; placing a sphere on the polymeric layer; softening the polymeric layer to make a portion of the sphere sink into the polymeric layer; forming a specific light absorbing layer on the polymeric layer; illuminating the sphere and the specific light absorbing layer with specific light such that the specific light is focused by the sphere to expose the polymeric layer to form an exposed portion and an unexposed portion; removing the specific light absorbing layer; and baking the polymeric layer and then removing the unexposed portion. A self-aligned stylus with high sphericity is also disclosed.</description><subject>MEASURING</subject><subject>MEASURING ANGLES</subject><subject>MEASURING AREAS</subject><subject>MEASURING IRREGULARITIES OF SURFACES OR CONTOURS</subject><subject>MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS</subject><subject>PHYSICS</subject><subject>TESTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2012</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNyjsKAjEQANA0FqLeYS4QWFZFa0WxsVqtlyGZ7ATyYzNB9vY2HsDqNW-tngMFpzH4KZGFKktoFT5eGNhPrGthmr3xsgAmC5GEs4XsIGJqDo202acJhAkqRtqqlcNQafdzo-B-e10fmkoeqRY0lEjG93DuD113PF36_R_lC4M7Ngo</recordid><startdate>20120814</startdate><enddate>20120814</enddate><creator>SHIH PO-JEN</creator><creator>SHIH WEN-PIN</creator><creator>WU MING-DAO</creator><creator>CHANG DUO-RU</creator><creator>TSAO LII</creator><creator>TSAI YAOUAN</creator><scope>EVB</scope></search><sort><creationdate>20120814</creationdate><title>Self-aligned stylus with high-sphericity and method of manufacturing the same</title><author>SHIH PO-JEN ; SHIH WEN-PIN ; WU MING-DAO ; CHANG DUO-RU ; TSAO LII ; TSAI YAOUAN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US8240057B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2012</creationdate><topic>MEASURING</topic><topic>MEASURING ANGLES</topic><topic>MEASURING AREAS</topic><topic>MEASURING IRREGULARITIES OF SURFACES OR CONTOURS</topic><topic>MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS</topic><topic>PHYSICS</topic><topic>TESTING</topic><toplevel>online_resources</toplevel><creatorcontrib>SHIH PO-JEN</creatorcontrib><creatorcontrib>SHIH WEN-PIN</creatorcontrib><creatorcontrib>WU MING-DAO</creatorcontrib><creatorcontrib>CHANG DUO-RU</creatorcontrib><creatorcontrib>TSAO LII</creatorcontrib><creatorcontrib>TSAI YAOUAN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SHIH PO-JEN</au><au>SHIH WEN-PIN</au><au>WU MING-DAO</au><au>CHANG DUO-RU</au><au>TSAO LII</au><au>TSAI YAOUAN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Self-aligned stylus with high-sphericity and method of manufacturing the same</title><date>2012-08-14</date><risdate>2012</risdate><abstract>A method of manufacturing a self-aligned stylus with high sphericity includes the steps of: forming a polymeric layer on a substrate; placing a sphere on the polymeric layer; softening the polymeric layer to make a portion of the sphere sink into the polymeric layer; forming a specific light absorbing layer on the polymeric layer; illuminating the sphere and the specific light absorbing layer with specific light such that the specific light is focused by the sphere to expose the polymeric layer to form an exposed portion and an unexposed portion; removing the specific light absorbing layer; and baking the polymeric layer and then removing the unexposed portion. A self-aligned stylus with high sphericity is also disclosed.</abstract><oa>free_for_read</oa></addata></record> |
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subjects | MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS PHYSICS TESTING |
title | Self-aligned stylus with high-sphericity and method of manufacturing the same |
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