Photosensitive polymer composition, method of producing pattern and electronic parts

A photosensitive polymer composition includes (a) a polyamide having a repeating unit represented by the following general formula (I): wherein U represents a tetravalent organic group, V represents a bivalent organic group and p is an integer representing a number of the repeating unit; (b) a compo...

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Bibliographische Detailangaben
Hauptverfasser: UENO TAKUMI, TSUMARU YOSHIKO, KAWASAKI DAI, KOMATSU HIROSHI, KATOU KOUJI, OOE MASAYUKI
Format: Patent
Sprache:eng
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Zusammenfassung:A photosensitive polymer composition includes (a) a polyamide having a repeating unit represented by the following general formula (I): wherein U represents a tetravalent organic group, V represents a bivalent organic group and p is an integer representing a number of the repeating unit; (b) a compound which generates an acid upon receiving light; and (c) a compound represented by the following general formula (II): wherein m and n are each independently integer of 1 or 2, Rs are each independently hydrogen, alkyl group or acyl group, and R1 and R2 each independently represents fluoroalkyl group having 1 to 3 carbon atoms.