Distributor base
A distributor bottom, particularly a nozzle-type distributor bottom, for steadily introducing process gas, especially process gas loaded with solid particles, into a process chamber, optionally to create a fluidized bed. The process chamber is disposed above the distributor bottom and is formed by w...
Gespeichert in:
| Hauptverfasser: | , , , , , , , , |
|---|---|
| Format: | Patent |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | HAUZENBERGER FRANZ SHIN MYOUNG KYUN LEE JUN HYUK ZEHETBAUER KARL NAMKUNG WON KIM HANG GOO CHOI NAG JOON CHO MINYOUNG JEONG SUN-KWANG |
| description | A distributor bottom, particularly a nozzle-type distributor bottom, for steadily introducing process gas, especially process gas loaded with solid particles, into a process chamber, optionally to create a fluidized bed. The process chamber is disposed above the distributor bottom and is formed by walls of a reactor used for metallurgically, particularly thermally, treating feedstock. The distributor bottom is provided with a plurality of holes. Holes are arranged near the walls to prevent substances from attaching to the reactor walls. Special arrangements relate to nozzles and ducts. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US8221674B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US8221674B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US8221674B23</originalsourceid><addsrcrecordid>eNrjZBBwySwuKcpMKi3JL1JISixO5WFgTUvMKU7lhdLcDApuriHOHrqpBfnxqcUFicmpeakl8aHBFkZGhmbmJk5GxkQoAQB8ix8b</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Distributor base</title><source>esp@cenet</source><creator>HAUZENBERGER FRANZ ; SHIN MYOUNG KYUN ; LEE JUN HYUK ; ZEHETBAUER KARL ; NAMKUNG WON ; KIM HANG GOO ; CHOI NAG JOON ; CHO MINYOUNG ; JEONG SUN-KWANG</creator><creatorcontrib>HAUZENBERGER FRANZ ; SHIN MYOUNG KYUN ; LEE JUN HYUK ; ZEHETBAUER KARL ; NAMKUNG WON ; KIM HANG GOO ; CHOI NAG JOON ; CHO MINYOUNG ; JEONG SUN-KWANG</creatorcontrib><description>A distributor bottom, particularly a nozzle-type distributor bottom, for steadily introducing process gas, especially process gas loaded with solid particles, into a process chamber, optionally to create a fluidized bed. The process chamber is disposed above the distributor bottom and is formed by walls of a reactor used for metallurgically, particularly thermally, treating feedstock. The distributor bottom is provided with a plurality of holes. Holes are arranged near the walls to prevent substances from attaching to the reactor walls. Special arrangements relate to nozzles and ducts.</description><language>eng</language><subject>CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY ; PERFORMING OPERATIONS ; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL ; THEIR RELEVANT APPARATUS ; TRANSPORTING</subject><creationdate>2012</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20120717&DB=EPODOC&CC=US&NR=8221674B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20120717&DB=EPODOC&CC=US&NR=8221674B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>HAUZENBERGER FRANZ</creatorcontrib><creatorcontrib>SHIN MYOUNG KYUN</creatorcontrib><creatorcontrib>LEE JUN HYUK</creatorcontrib><creatorcontrib>ZEHETBAUER KARL</creatorcontrib><creatorcontrib>NAMKUNG WON</creatorcontrib><creatorcontrib>KIM HANG GOO</creatorcontrib><creatorcontrib>CHOI NAG JOON</creatorcontrib><creatorcontrib>CHO MINYOUNG</creatorcontrib><creatorcontrib>JEONG SUN-KWANG</creatorcontrib><title>Distributor base</title><description>A distributor bottom, particularly a nozzle-type distributor bottom, for steadily introducing process gas, especially process gas loaded with solid particles, into a process chamber, optionally to create a fluidized bed. The process chamber is disposed above the distributor bottom and is formed by walls of a reactor used for metallurgically, particularly thermally, treating feedstock. The distributor bottom is provided with a plurality of holes. Holes are arranged near the walls to prevent substances from attaching to the reactor walls. Special arrangements relate to nozzles and ducts.</description><subject>CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY</subject><subject>PERFORMING OPERATIONS</subject><subject>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</subject><subject>THEIR RELEVANT APPARATUS</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2012</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZBBwySwuKcpMKi3JL1JISixO5WFgTUvMKU7lhdLcDApuriHOHrqpBfnxqcUFicmpeakl8aHBFkZGhmbmJk5GxkQoAQB8ix8b</recordid><startdate>20120717</startdate><enddate>20120717</enddate><creator>HAUZENBERGER FRANZ</creator><creator>SHIN MYOUNG KYUN</creator><creator>LEE JUN HYUK</creator><creator>ZEHETBAUER KARL</creator><creator>NAMKUNG WON</creator><creator>KIM HANG GOO</creator><creator>CHOI NAG JOON</creator><creator>CHO MINYOUNG</creator><creator>JEONG SUN-KWANG</creator><scope>EVB</scope></search><sort><creationdate>20120717</creationdate><title>Distributor base</title><author>HAUZENBERGER FRANZ ; SHIN MYOUNG KYUN ; LEE JUN HYUK ; ZEHETBAUER KARL ; NAMKUNG WON ; KIM HANG GOO ; CHOI NAG JOON ; CHO MINYOUNG ; JEONG SUN-KWANG</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US8221674B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2012</creationdate><topic>CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY</topic><topic>PERFORMING OPERATIONS</topic><topic>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</topic><topic>THEIR RELEVANT APPARATUS</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>HAUZENBERGER FRANZ</creatorcontrib><creatorcontrib>SHIN MYOUNG KYUN</creatorcontrib><creatorcontrib>LEE JUN HYUK</creatorcontrib><creatorcontrib>ZEHETBAUER KARL</creatorcontrib><creatorcontrib>NAMKUNG WON</creatorcontrib><creatorcontrib>KIM HANG GOO</creatorcontrib><creatorcontrib>CHOI NAG JOON</creatorcontrib><creatorcontrib>CHO MINYOUNG</creatorcontrib><creatorcontrib>JEONG SUN-KWANG</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HAUZENBERGER FRANZ</au><au>SHIN MYOUNG KYUN</au><au>LEE JUN HYUK</au><au>ZEHETBAUER KARL</au><au>NAMKUNG WON</au><au>KIM HANG GOO</au><au>CHOI NAG JOON</au><au>CHO MINYOUNG</au><au>JEONG SUN-KWANG</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Distributor base</title><date>2012-07-17</date><risdate>2012</risdate><abstract>A distributor bottom, particularly a nozzle-type distributor bottom, for steadily introducing process gas, especially process gas loaded with solid particles, into a process chamber, optionally to create a fluidized bed. The process chamber is disposed above the distributor bottom and is formed by walls of a reactor used for metallurgically, particularly thermally, treating feedstock. The distributor bottom is provided with a plurality of holes. Holes are arranged near the walls to prevent substances from attaching to the reactor walls. Special arrangements relate to nozzles and ducts.</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng |
| recordid | cdi_epo_espacenet_US8221674B2 |
| source | esp@cenet |
| subjects | CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL THEIR RELEVANT APPARATUS TRANSPORTING |
| title | Distributor base |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-22T16%3A26%3A11IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=HAUZENBERGER%20FRANZ&rft.date=2012-07-17&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS8221674B2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |