Distributor base

A distributor bottom, particularly a nozzle-type distributor bottom, for steadily introducing process gas, especially process gas loaded with solid particles, into a process chamber, optionally to create a fluidized bed. The process chamber is disposed above the distributor bottom and is formed by w...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	HAUZENBERGER FRANZ, SHIN MYOUNG KYUN, LEE JUN HYUK, ZEHETBAUER KARL, NAMKUNG WON, KIM HANG GOO, CHOI NAG JOON, CHO MINYOUNG, JEONG SUN-KWANG
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL THEIR RELEVANT APPARATUS TRANSPORTING
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Beschreibung
Zusammenfassung:	A distributor bottom, particularly a nozzle-type distributor bottom, for steadily introducing process gas, especially process gas loaded with solid particles, into a process chamber, optionally to create a fluidized bed. The process chamber is disposed above the distributor bottom and is formed by walls of a reactor used for metallurgically, particularly thermally, treating feedstock. The distributor bottom is provided with a plurality of holes. Holes are arranged near the walls to prevent substances from attaching to the reactor walls. Special arrangements relate to nozzles and ducts.