Plasma arc coating system and method

In an embodiment an apparatus for coating a substrate comprises: an array of plasma arcs; a first plurality of reagent manifolds located upstream of the array of plasma arcs and a second plurality of reagent manifolds located downstream of the array of plasma arcs, each manifold having at least one...

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Bibliographische Detailangaben
1. Verfasser:	GASWORTH STEVEN M
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC HEATING ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	In an embodiment an apparatus for coating a substrate comprises: an array of plasma arcs; a first plurality of reagent manifolds located upstream of the array of plasma arcs and a second plurality of reagent manifolds located downstream of the array of plasma arcs, each manifold having at least one orifice through which a reagent is ejected into a plasma jet issuing from a respective plasma arc; and a controller which modulates the flow of reagent to each manifold according to the contours of the substrate and to the substrate position relative to the plasma arcs and the manifolds.