High voltage LDMOS transistor

An LDMOS transistor structure and methods of making the same are provided. The structure includes a gate electrode extended on an upper boundary of an extension dielectric region that separates the gate electrode from the drain region of the LDMOS transistor. Moreover, at an area close to an edge of...

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Bibliographische Detailangaben
Hauptverfasser: TIEN WILLIAM WEI-YUAN, CHEN FU-HSIN, TSENG CHAO-WEI
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:An LDMOS transistor structure and methods of making the same are provided. The structure includes a gate electrode extended on an upper boundary of an extension dielectric region that separates the gate electrode from the drain region of the LDMOS transistor. Moreover, at an area close to an edge of the extended gate electrode portion, the gate electrode further projects downwards into a convex-shaped recess or groove in the upper boundary of the extension dielectric region, forming a tongue. LDMOS transistors with this structure may provide improved suppression of hot carrier effects.