Doped implant monitoring for microchip tamper detection

A method and apparatus include conductive material doped within a microchip that accumulates a detectable charge in the presence of ions. Such ions may result from a focused ion beam or other unwelcome technology exploitation effort. Circuitry sensing the charge buildup in the embedded, doped materi...

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Bibliographische Detailangaben
Hauptverfasser: SHEETS, II JOHN E, GERMANN PHILIP R, MAXSON MARK O, MAKI ANDREW B, BECKER DARRYL J, CHRISTENSEN TODD A, DAHLEN PAUL E, BARTLEY GERALD K
Format: Patent
Sprache:eng
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Zusammenfassung:A method and apparatus include conductive material doped within a microchip that accumulates a detectable charge in the presence of ions. Such ions may result from a focused ion beam or other unwelcome technology exploitation effort. Circuitry sensing the charge buildup in the embedded, doped material may initiate a defensive action intended to defeat the tampering operation.