Coating and developing apparatus, coating and developing method, and storage medium

A coating and developing apparatus has: a treatment block-including a water repellent module performing water repellent treatment on a substrate, a coating module, and a developing module; a substrate side-surface portion water repellent module for performing water repellent treatment on a side surf...

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Bibliographische Detailangaben
Hauptverfasser:	HONTAKE KOUICHI, KYOUDA HIDEHARU
Format:	Patent
Sprache:	eng
Schlagworte:	AUXILIARY PROCESSES IN PHOTOGRAPHY BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES PHOTOGRAPHY PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	A coating and developing apparatus has: a treatment block-including a water repellent module performing water repellent treatment on a substrate, a coating module, and a developing module; a substrate side-surface portion water repellent module for performing water repellent treatment on a side surface of a substrate; and a control unit controlling operations of the modules to execute steps of performing water repellent treatment at least on a side surface portion of a substrate and performing a first resist coating on an entire surface of the substrate; performing a first development after a first liquid-immersion exposure is performed; performing a second resist coating on the entire surface, and performing a second development after a second liquid-immersion exposure is performed, and further to execute a step of performing water repellent treatment on the side surface portion of the substrate after the first development and before the second exposure is performed.