Composite structure and production method thereof

A composite structure having excellent plasma resistance includes a base material having a surface containing a ceramic polycrystal and a structure formed on the surface of the base material containing the ceramic polycrystal, wherein the structure contains a polycrystal containing a brittle materia...

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Bibliographische Detailangaben
Hauptverfasser:	IWASAWA JUNICHI, HATONO HIRONORI
Format:	Patent
Sprache:	eng
Schlagworte:	APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL PERFORMING OPERATIONS PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL SPRAYING OR ATOMISING IN GENERAL TRANSPORTING
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Beschreibung
Zusammenfassung:	A composite structure having excellent plasma resistance includes a base material having a surface containing a ceramic polycrystal and a structure formed on the surface of the base material containing the ceramic polycrystal, wherein the structure contains a polycrystal containing a brittle material; a grain boundary layer having a glass layer does not substantially exist on a boundary face between crystals forming the polycrystal; a part of the polycrystal forms an anchor part embedded into the base material surface; and an average roughness (Ra) of an interface between the anchor part and the base material surface is 100 nm or less.