Semiconductor process chamber

A process chamber 10 comprising a container (12), a lid (14), and a sealed interface (16) therebetween. The container's interface surface (30) and/or the lid's interface surface (32) includes at least one groove (36) in which a seal (40) is situated. The seal (40) comprises an elastomeric...

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Bibliographische Detailangaben
Hauptverfasser:	MORE DOMINICK G, AMOS PETER G, CORNETT KENNETH W, DATTA AMITAVA, PAYNE JEREMY
Format:	Patent
Sprache:	eng
Schlagworte:	BLASTING CYLINDERS ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS HEATING LIGHTING MECHANICAL ENGINEERING PISTONS SEALINGS THERMAL INSULATION IN GENERAL WEAPONS
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Beschreibung
Zusammenfassung:	A process chamber 10 comprising a container (12), a lid (14), and a sealed interface (16) therebetween. The container's interface surface (30) and/or the lid's interface surface (32) includes at least one groove (36) in which a seal (40) is situated. The seal (40) comprises an elastomeric element (50) and a metallic element (60). The elastomeric element (50) and the metallic element (60) can be arranged and adapted to seal the chamber's interface (16) sequentially during its conversion to a sealed condition. And/or the elastomeric element (50) and the metallic element (60) can be arranged and adapted to seal the chamber's interface in series once the lid (14) is in its sealed condition.