Semiconductor device

A semiconductor device having a physical pattern based on a designed pattern is provided. The designed pattern includes a target pattern and a correction pattern. The target pattern includes a first portion of an edge with a first distance between the first portion and a pattern opposed thereto, a s...

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Bibliographische Detailangaben
1. Verfasser:	KOTANI TOSHIYA
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR AUXILIARY PROCESSES IN PHOTOGRAPHY BASIC ELECTRIC ELEMENTS CALCULATING CINEMATOGRAPHY COMPUTING COUNTING ELECTRIC DIGITAL DATA PROCESSING ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY GAMMA RAY OR X-RAY MICROSCOPES HOLOGRAPHY IRRADIATION DEVICES MATERIALS THEREFOR NUCLEAR ENGINEERING NUCLEAR PHYSICS ORIGINALS THEREFOR PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES PHYSICS SEMICONDUCTOR DEVICES TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR
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Beschreibung
Zusammenfassung:	A semiconductor device having a physical pattern based on a designed pattern is provided. The designed pattern includes a target pattern and a correction pattern. The target pattern includes a first portion of an edge with a first distance between the first portion and a pattern opposed thereto, a second portion of the edge with a second distance between the second portion and a pattern opposed thereto, which is different from the first distance, and a third portion of the edge having a first region of the edge with the first distance between the first region and the pattern opposed thereto.