Method of producing polishing pad

The present invention relates to a method of producing a polishing pad, comprising steps of: (a) providing a base material comprising a plurality of fibers; said base material having a surface for polishing a substrate, wherein the fibers comprise a core and a cladding surrounding the core, and the...

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Bibliographische Detailangaben
Hauptverfasser: YAO I-PENG, FENG CHUNGIH, HUNG YUNGANG
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:The present invention relates to a method of producing a polishing pad, comprising steps of: (a) providing a base material comprising a plurality of fibers; said base material having a surface for polishing a substrate, wherein the fibers comprise a core and a cladding surrounding the core, and the cladding comprises a hydrophobic polymer; (b) impregnating the surface of the base material with an elastomer solution; (c) coagulating the elastomer impregnated in the surface of the base material to mold the elastomer and to form a plurality of first continuous pores between the elastomer, and between the elastomer and the fibers; (d) planarizing the surface of the base material; (e) impregnating the surface of the base material and elastomer obtained in the step (d) with a condition polymer solution; and (e) curing the condition polymer impregnated in the surface of the base material and elastomer and partially filling the condition polymer into the first continuous pores to form a plurality of second continuous pores.