Film stacks to prevent UV-induced device damage

Film stacks to prevent UV-induced device damage

A film stack includes an interlayer dielectric formed over one or more devices. The film stack further includes a first layer having a high extinction coefficient formed on the interlayer dielectric and a second layer having a low extinction coefficient formed on the first layer. The first and secon...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: CHENG NING, NGO MINH VAN, HUI ANGELA T, TOKUNO HIROKAZU, LI WENMEI
Format: Patent
Sprache:eng
Schlagworte:
LAYERED PRODUCTS
LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PERFORMING OPERATIONS
PHYSICS
TRANSPORTING
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Beschreibung
Zusammenfassung:A film stack includes an interlayer dielectric formed over one or more devices. The film stack further includes a first layer having a high extinction coefficient formed on the interlayer dielectric and a second layer having a low extinction coefficient formed on the first layer. The first and second layers prevent ultraviolet induced damage to the one or more devices while minimizing reflectivity for lithographic processes.