Resist composition and method of pattern formation with the same

A resist composition comprises (A) a compound having a molecular weight of 3,000 or lower which has in its molecule a structure having two or more monovalent anions and a structure having two or more monovalent cations.

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Hauptverfasser: WADA KENJI, TAKAHASHI HYOU
Format: Patent
Sprache:eng
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Zusammenfassung:A resist composition comprises (A) a compound having a molecular weight of 3,000 or lower which has in its molecule a structure having two or more monovalent anions and a structure having two or more monovalent cations.