System and method for making photomasks

The present disclosure is directed a method for preparing a system of photomask patterns for implementing a drawn pattern on a substrate with a multi-patterning lithography process. The method comprises receiving data describing a drawn pattern. A first photomask pattern is formed for implementing a...

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Bibliographische Detailangaben
1. Verfasser:	ATON THOMAS J
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR AUXILIARY PROCESSES IN PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES PHYSICS
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Beschreibung
Zusammenfassung:	The present disclosure is directed a method for preparing a system of photomask patterns for implementing a drawn pattern on a substrate with a multi-patterning lithography process. The method comprises receiving data describing a drawn pattern. A first photomask pattern is formed for implementing a region of the drawn pattern on the substrate. A second photomask pattern is formed comprising one or more pattern features having longitudinal edges for implementing the region of the drawn pattern on the substrate, wherein at least 90% of all the longitudinal edges of the second photomask pattern that are positioned within the region are oriented in substantially the same direction. Both a system for forming the photomask patterns and a process for patterning a device using the photomask patterns are also disclosed.