In-situ dose monitoring using optical emission spectroscopy
The present invention generally provides methods and apparatus for monitoring ion dosage during a plasma process. One embodiment of the present invention provides a method for processing a substrate comprising generating a correlation between the at least one attribute of optical emissions of the pl...
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | The present invention generally provides methods and apparatus for monitoring ion dosage during a plasma process. One embodiment of the present invention provides a method for processing a substrate comprising generating a correlation between the at least one attribute of optical emissions of the plasma and a dosage quantity. In one embodiment, the attribute of optical emissions of the plasma is optical emission intensity of an ion species in the plasma. |
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