Method and apparatus for multi-beam exposure

A multi-beam exposure apparatus of the present invention includes a two-dimensional light modulator which is configured to project plural exposure beam spots onto an exposure surface, the plural exposure beam spots being arranged in parallel with the scanning direction while two-dimensionally arraye...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser:	MIYAGAWA ICHIROU
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY CORRECTION OF TYPOGRAPHICAL ERRORS ELECTROGRAPHY HOLOGRAPHY i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME LINING MACHINES MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PRINTING SELECTIVE PRINTING MECHANISMS STAMPS TRANSPORTING TYPEWRITERS
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Beschreibung
Zusammenfassung:	A multi-beam exposure apparatus of the present invention includes a two-dimensional light modulator which is configured to project plural exposure beam spots onto an exposure surface, the plural exposure beam spots being arranged in parallel with the scanning direction while two-dimensionally arrayed; and a pixel block shifting member which divides the plural beam spots into plural blocks in the scanning direction and projects the plural exposure beam spots onto the exposure surface by shifting a relative position between the blocks in a direction orthogonal to a scanning direction, and thereby the scan-exposing of a space between the exposure beam spots in the direction orthogonal to the scanning direction is performed with the exposure beam spot of another block. According to the multi-beam exposure apparatus, the number of dots which can simultaneously be exposed in the direction orthogonal to the scanning direction can be increased.