Wafer aligning apparatus and related method

Embodiments of the invention provide a wafer aligning apparatus and a wafer aligning method. In one embodiment, the wafer aligning apparatus comprises an imaging unit adapted to take an image of a wafer being transferred from a load lock chamber to a transfer chamber and adapted to convert the image...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: LEE HEOK-JAE, PARK HYU-RIM, KIM SANG-HO, SEO KEE-WEONE, WOO CHANG-WOO, BAE DO-IN
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:Embodiments of the invention provide a wafer aligning apparatus and a wafer aligning method. In one embodiment, the wafer aligning apparatus comprises an imaging unit adapted to take an image of a wafer being transferred from a load lock chamber to a transfer chamber and adapted to convert the image into digital signals, and a signal processing unit adapted to calculate a center alignment correction value for the wafer by comparing the digital signals to a master image stored in the signal processing unit. The wafer aligning apparatus further comprises a robot controller adapted to receive the center alignment correction value from the signal processing unit and adapted to control a transfer robot in accordance with the center alignment correction value to provide the wafer to a process chamber such that the center of the wafer is substantially aligned.