Small lot size lithography bays

In a first aspect, a small lot size lithography bay is provided. The small lot size lithography bay includes (1) a plurality of lithography tools; and (2) a small lot size transport system adapted to transport small lot size substrate carriers to the lithography tools. Each small lot size substrate...

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Bibliographische Detailangaben
Hauptverfasser: SHAH VINAY, ENGLHARDT ERIC ANDREW
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:In a first aspect, a small lot size lithography bay is provided. The small lot size lithography bay includes (1) a plurality of lithography tools; and (2) a small lot size transport system adapted to transport small lot size substrate carriers to the lithography tools. Each small lot size substrate carrier is adapted to hold fewer than 13 substrates. Numerous other aspects are provided.