Treatment solution supply apparatus
A treatment solution supply apparatus capable of reducing an initial overshooting amount and ensuring a stable dispense characteristic even when treating a large amount of substrates as recycling a developing solution for a large amount of substrates includes a flow meter having an integration funct...
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | A treatment solution supply apparatus capable of reducing an initial overshooting amount and ensuring a stable dispense characteristic even when treating a large amount of substrates as recycling a developing solution for a large amount of substrates includes a flow meter having an integration function in the vicinity of a nozzle and carries out feedback to the pump revolution frequency control in response to a variation of the flow meter, so that a fixed amount of a solution may be regularly discharged irrespective of the clogging level of a filter. Also, a developing solution can be stably dispensed on a resist coated film within a solution applicable range from a minimum value (film thickness of 1 mm) to a maximum value (3 mm). |
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