Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method

Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method

A fault detection and classification method is disclosed that uses raw back-focal-plane image data of radiation from a substrate surface, detected by a scatterometer detector, to determine a variation in the raw data and correlate the variation in the raw data with a possible fault in a lithographic...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: MOS EVERHARDUS CORNELIS, HOOGENBOOM THOMAS LEO MARIA, DEN BOEF ARIE JEFFREY, VAN DER SCHAAR MAURITS
Format: Patent
Sprache:eng
Schlagworte:
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
PHYSICS
TESTING
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Beschreibung
Zusammenfassung:A fault detection and classification method is disclosed that uses raw back-focal-plane image data of radiation from a substrate surface, detected by a scatterometer detector, to determine a variation in the raw data and correlate the variation in the raw data with a possible fault in a lithographic apparatus or a process that patterned the substrate surface. The correlation is carried out by comparing the variation in the raw data with known metrology data. Once a fault has been determined, a user may be notified of the fault.