Lithographic apparatus and device manufacturing method

An immersion lithographic projection apparatus is disclosed in which a liquid removal system surrounds a liquid supply system which provides liquid to a space between a projection system and a substrate. The liquid removal system is moveable relative to the liquid supply system and is controlled to...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	JACOBS HERNES, JANSEN HANS, VAN DER HOEVEN JAN CORNELIS, VAN DER SCHOOT HARMEN KLAUS, MULKENS JOHANNES CATHARINUS HUBERTUS, LEENDERS MARTINUS HENDRIKUS ANTONIUS, STREEFKERK BOB, STAVENGA MARCO KOERT, VERMEULEN MARCUS MARTINUS PETRUS ADRIANUS, STEIJAERT PETER PAUL, TEN KATE NICOLAAS, LOOPSTRA ERIK ROELOF, GILISSEN NOUD JAN, KEMPER NICOLAAS RUDOLF
Format:	Patent
Sprache:	eng
Schlagworte:	ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY PHOTOGRAPHY PHYSICS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!