Lithographic apparatus and device manufacturing method

An immersion lithographic projection apparatus is disclosed in which a liquid removal system surrounds a liquid supply system which provides liquid to a space between a projection system and a substrate. The liquid removal system is moveable relative to the liquid supply system and is controlled to...

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Bibliographische Detailangaben
Hauptverfasser:	JACOBS HERNES, JANSEN HANS, VAN DER HOEVEN JAN CORNELIS, VAN DER SCHOOT HARMEN KLAUS, MULKENS JOHANNES CATHARINUS HUBERTUS, LEENDERS MARTINUS HENDRIKUS ANTONIUS, STREEFKERK BOB, STAVENGA MARCO KOERT, VERMEULEN MARCUS MARTINUS PETRUS ADRIANUS, STEIJAERT PETER PAUL, TEN KATE NICOLAAS, LOOPSTRA ERIK ROELOF, GILISSEN NOUD JAN, KEMPER NICOLAAS RUDOLF
Format:	Patent
Sprache:	eng
Schlagworte:	ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY PHOTOGRAPHY PHYSICS
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Beschreibung
Zusammenfassung:	An immersion lithographic projection apparatus is disclosed in which a liquid removal system surrounds a liquid supply system which provides liquid to a space between a projection system and a substrate. The liquid removal system is moveable relative to the liquid supply system and is controlled to have substantially zero velocity relative to the moving substrate table. The gap between the liquid supply system and the liquid removal system may be covered and the atmosphere between the liquid supply system and the liquid removal system above the substrate table may be maintained such that the vapor pressure of liquid is relatively high.