Lithographic apparatus

The invention provides a height detecting apparatus for a lithographic apparatus. The height mapping apparatus includes a height mapping unit for providing at least one height map of a top surface of an object to be placed in a radiation beam of the lithographic apparatus, the object to be clamped b...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: OTTENS JOOST JEROEN, VAN MEER ASCHWIN LODEWIJK HENDRICUS JOHANNES, VINK JACOB WILLEM, COMPEN RENE THEODORUS PETRUS, TEL WIM TJIBBO, GERRITS PETRUS JOHANNES
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:The invention provides a height detecting apparatus for a lithographic apparatus. The height mapping apparatus includes a height mapping unit for providing at least one height map of a top surface of an object to be placed in a radiation beam of the lithographic apparatus, the object to be clamped by a clamping force applied thereto on a support constructed to support the object. The height mapping apparatus also includes a control unit for controlling the mapping unit to provide the at least one height map of the object relative to at least two different clamping pressure levels.