Composition and associated method

A composition includes a metal precursor. The metal precursor may include an inorganic ligand and a metal cation. The inorganic ligand may include a carbamate group. An associated method is provided.

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Bibliographische Detailangaben
Hauptverfasser: ANGELIU THOMAS MARTIN, GIBSON, III DAVID ALEXANDER, SIMONE DAVIDE LOUIS, LEWIS LARRY NEIL, ZHANG JIAN, CARTER CHRISTOPHER MICHAEL
Format: Patent
Sprache:eng
Schlagworte:
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Zusammenfassung:A composition includes a metal precursor. The metal precursor may include an inorganic ligand and a metal cation. The inorganic ligand may include a carbamate group. An associated method is provided.