Method and apparatus for integrating metrology with etch processing

An apparatus for integrating metrology and etch processing is disclosed. The apparatus comprises a multi-chamber system having a transfer chamber, an etch chamber and a metrology chamber, and a robot configured to transfer a substrate between the etch chamber and the metrology chamber. A method of p...

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Bibliographische Detailangaben
Hauptverfasser:	LEWINGTON RICHARD, NGUYEN KHIEM K
Format:	Patent
Sprache:	eng
Schlagworte:	DECORATIVE ARTS MEASURING MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER,MECHANICAL EFFICIENCY, OR FLUID PRESSURE MOSAICS PAPERHANGING PERFORMING OPERATIONS PHYSICS PRODUCING DECORATIVE EFFECTS TARSIA WORK TESTING TRANSPORTING
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Beschreibung
Zusammenfassung:	An apparatus for integrating metrology and etch processing is disclosed. The apparatus comprises a multi-chamber system having a transfer chamber, an etch chamber and a metrology chamber, and a robot configured to transfer a substrate between the etch chamber and the metrology chamber. A method of processing a substrate and performing metrology measurement using this apparatus is also disclosed.