Nozzle for supplying treatment liquid and substrate treating apparatus

A nozzle for supplying a treatment liquid which makes it possible to perform uniform cleaning to a surface of a substrate even in a case where the size of a substrate is large. A slit-shaped ejection hole is formed at the lower end of the nozzle for supplying a treatment liquid. In the nozzle, a pas...

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Bibliographische Detailangaben
1. Verfasser:	SHIMAI FUTOSHI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ATOMISING APPARATUS NOZZLES PERFORMING OPERATIONS SPRAYING APPARATUS SPRAYING OR ATOMISING IN GENERAL TRANSPORTING
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Beschreibung
Zusammenfassung:	A nozzle for supplying a treatment liquid which makes it possible to perform uniform cleaning to a surface of a substrate even in a case where the size of a substrate is large. A slit-shaped ejection hole is formed at the lower end of the nozzle for supplying a treatment liquid. In the nozzle, a passage for supplying a treatment liquid which leads to the slit-shaped ejection hole is formed by bonding two nozzle parts to each other. Projections are provided on the abutting surface of at least one of the two nozzle parts so as to divide a treatment liquid flowing downward through the supply passage into left and right.