Titanocene based compound, photosensitive composition, photosensitive transfer sheet and pattern forming method

Titanocene based compound, photosensitive composition, photosensitive transfer sheet and pattern forming method

A titanocene compound having a carbonyl group, and a photosensitive composition whose sensitivity has been enhanced by containing this as a photopolymerization initiator, a photosensitive transfer sheet using said photosensitive composition, and a pattern forming method using said photosensitive tra...

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1. Verfasser: SUGIYAMA TAKEKATSU
Format: Patent
Sprache:eng
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APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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creator SUGIYAMA TAKEKATSU
description A titanocene compound having a carbonyl group, and a photosensitive composition whose sensitivity has been enhanced by containing this as a photopolymerization initiator, a photosensitive transfer sheet using said photosensitive composition, and a pattern forming method using said photosensitive transfer sheet are provided.
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subjects APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
title Titanocene based compound, photosensitive composition, photosensitive transfer sheet and pattern forming method
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