Titanocene based compound, photosensitive composition, photosensitive transfer sheet and pattern forming method

Titanocene based compound, photosensitive composition, photosensitive transfer sheet and pattern forming method

A titanocene compound having a carbonyl group, and a photosensitive composition whose sensitivity has been enhanced by containing this as a photopolymerization initiator, a photosensitive transfer sheet using said photosensitive composition, and a pattern forming method using said photosensitive tra...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser: SUGIYAMA TAKEKATSU
Format: Patent
Sprache:eng
Schlagworte:
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Beschreibung
Zusammenfassung:A titanocene compound having a carbonyl group, and a photosensitive composition whose sensitivity has been enhanced by containing this as a photopolymerization initiator, a photosensitive transfer sheet using said photosensitive composition, and a pattern forming method using said photosensitive transfer sheet are provided.