Lithographic support structure

The present invention relates to a lithographic projection apparatus with a supporting structure to support and move an object, like a substrate. The supporting structure may be a robot having a robotic arm with a support frame for supporting, e.g. the substrate. The support frame includes a clampin...

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Hauptverfasser: VAN DEN BERG JOHANNES CHARLES ADRIANUS, VAN DE SANDE HENRICUS JOHANNES ADRIANUS, VAN MEER ASCHWIN LODEWIJK HENDRICUS JOHANNES, SMULDERS PATRICK JOHANNES CORNELUS HENDRIK, VAN ELP JAN, SPANJERS FRANCISCUS ANDREAS CORNELIS JOHANNES, VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS, VERVOORT THIJS, TEGENBOSCH HENRICUS GERARDUS, BUIS EDWIN JOHAN, TINNEMANS PATRICIUS ALOYSIUS JACOBUS, HOOGKAMP JAN FREDERIK, DONDERS SJOERD NICOLAAS LAMBERTUS, VISSER RAIMOND
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:The present invention relates to a lithographic projection apparatus with a supporting structure to support and move an object, like a substrate. The supporting structure may be a robot having a robotic arm with a support frame for supporting, e.g. the substrate. The support frame includes a clamping structure having one or more clamps for holding the substrate during movement. The robot arm comprises one or more compliant parts. The clamp may be a Johnson-Raybeck effect type clamp with an oxidized upper surface. For better de-clamping, a RF AC decaying de-clamping voltage may be provided to the clamp. The apparatus may be cleaned with one single substrate only.