$Blazed diffractive optical element and projection objective for a microlithographic projection exposure apparatus$

Blazed diffractive optical element and projection objective for a microlithographic projection exposure apparatus

A diffractive optical element has a support and a plurality of diffraction structures. The latter are applied on the support and are binary blazed by being split into substructures so that the aspect ratio of the substructures varies locally within an individual diffraction structure. One or more su...

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Bibliographische Detailangaben
1. Verfasser:	KLEEMANN BERND
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A diffractive optical element has a support and a plurality of diffraction structures. The latter are applied on the support and are binary blazed by being split into substructures so that the aspect ratio of the substructures varies locally within an individual diffraction structure. One or more substructures with a large aspect ratio inside an individual diffraction structure are replaced by at least one substitute structure whose aspect ratio is less than that of the replaced substructures.