Contamination barrier and lithographic apparatus

A rotatable contamination barrier is disclosed. The barrier includes a plurality of closely packed blades for trapping contaminant material coming from an EUV radiation source. The blades are oriented radially relative to a central rotation axis of the contamination barrier. The contamination barrie...

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Bibliographische Detailangaben
1. Verfasser:	WASSINK ARNOUD CORNELIS
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MANUFACTURE OR TREATMENT OF NANOSTRUCTURES MATERIALS THEREFOR MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES NANOTECHNOLOGY ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES TRANSPORTING
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Beschreibung
Zusammenfassung:	A rotatable contamination barrier is disclosed. The barrier includes a plurality of closely packed blades for trapping contaminant material coming from an EUV radiation source. The blades are oriented radially relative to a central rotation axis of the contamination barrier. The contamination barrier is segmented in an inner segment and an outer segment relative to the central rotation axis. Accordingly, higher revolution speeds may be attained without compromising the contamination barrier.