Dual source XRF system

A dual source tube XRF system and method wherein a first x-ray source is employed to direct x-rays in a first energy band at a sample and at least a second x-ray source is employed to direct x-rays in a second energy band at the sample. A detector is responsive to x-rays emitted by the sample after...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: HUBBARD-NELSON BRADLEY, HARDMAN PETER JOHN
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A dual source tube XRF system and method wherein a first x-ray source is employed to direct x-rays in a first energy band at a sample and at least a second x-ray source is employed to direct x-rays in a second energy band at the sample. A detector is responsive to x-rays emitted by the sample after irradiation by the first and second x-ray sources. An analyzer is responsive to the detector and is configured to determine the amount of at least a first substance in the sample based on irradiation of the sample by the first x-ray source and to determine the amount of at least a second substance in the sample based on irradiation of the sample by the second x-ray source. A controller is responsive to the analyzer and is configured to energize the first and second x-ray sources either simultaneously or sequentially.