Lithographic template and method of formation and use

A lithographic template, a method of forming the lithographic template and a method for forming devices with the lithographic template is provided. The lithographic template ( 10 ) and the method of making comprises forming a transparent conductive layer ( 16 ) over a substrate ( 12 ). A SiCN layer ( 18 ) is formed over the transparent conductive layer ( 16 ), and a patterning layer ( 20 ) formed on the SiCN layer ( 18 ). The SiCN layer ( 18 ) is converted to an SiO2 layer by applying an O2 plasma ( 23 ). The SiO2 layer prevents damage to the transparent conductive layer ( 16 ) during cleaning and provides a binding mechanism for the imprint release coating.