Lithographic apparatus, device manufacturing method, device manufactured thereby, and computer program

The transmission or reflection loss due to surface contamination of a mask is predicted as a function of position on the mask and time. At the time of an exposure compensation for the transmission or reflection loss is effected using a device capable of adjusting the beam intensity across the length...

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Bibliographische Detailangaben
1. Verfasser:	VAN DER VEEN PAUL
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY ELECTROTHERAPY HOLOGRAPHY HUMAN NECESSITIES HYGIENE MAGNETOTHERAPY MATERIALS THEREFOR MEDICAL OR VETERINARY SCIENCE ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS RADIATION THERAPY SEMICONDUCTOR DEVICES ULTRASOUND THERAPY
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Beschreibung
Zusammenfassung:	The transmission or reflection loss due to surface contamination of a mask is predicted as a function of position on the mask and time. At the time of an exposure compensation for the transmission or reflection loss is effected using a device capable of adjusting the beam intensity across the length of an exposure field.