Method for determining projected lifetime of semiconductor devices with analytical extension of stress voltage window by scaling of oxide thickness

A method for efficiently and accurately measuring a maximum Vcc calculation or failure rate and lifetime projection for microprocessors and other semiconductor products analytically scales low voltages applied to thinner oxides to thicker oxides. The expanded voltage window that is closer to the use...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	ZHANG JOHN, MARATHE AMIT, TAYLOR KURT, ZHAO EUGENE, GEILENKEUSER ROLF, WEIDNER JOERG-OLIVER
Format:	Patent
Sprache:	eng
Schlagworte:	CALCULATING COMPUTING COUNTING ELECTRIC DIGITAL DATA PROCESSING MEASURING MEASURING ELECTRIC VARIABLES MEASURING MAGNETIC VARIABLES PHYSICS TESTING
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