Lithographic apparatus with two-dimensional alignment measurement arrangement and two-dimensional alignment measurement method

A lithographic apparatus having an actuator to move an object with a mark that includes a plurality of structures arranged in rows and columns. An alignment arrangement has a light source, optics and a detector. The light source and the optics produce an alignment beam with a first spot portion exte...

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Bibliographische Detailangaben
1. Verfasser:	VAN BILSEN FRANCISCUS BERNARDUS MARIA
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS TESTING
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Beschreibung
Zusammenfassung:	A lithographic apparatus having an actuator to move an object with a mark that includes a plurality of structures arranged in rows and columns. An alignment arrangement has a light source, optics and a detector. The light source and the optics produce an alignment beam with a first spot portion extending in a first direction that is parallel to the columns and a second spot portion extending in a second direction that is parallel to the rows. The optics direct the alignment beam to the mark, receive alignment radiation back from the mark and transmit the alignment radiation to the detector. The detector transmits an alignment signal to a processor that calculates a two-dimensional position of the mark based on the alignment signal.