Inspection method and inspection apparatus using electron beam

An inspection method and an inspection apparatus using an electron beam enabling more detailed and quantitative evaluation at a high throughput level. The method comprises the steps of irradiating, based on previously prepared information concerning a defect position on the surface of a sample, the...

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Bibliographische Detailangaben
Hauptverfasser: FUNATSU RYUICHI, INADA YOSHIKAZU, YAMAMOTO KENJIROU, NINOMIYA TAKU, NOZOE MARI, GUNJI YASUHIRO
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:An inspection method and an inspection apparatus using an electron beam enabling more detailed and quantitative evaluation at a high throughput level. The method comprises the steps of irradiating, based on previously prepared information concerning a defect position on the surface of a sample, the defect and its vicinity with an electron beam a plurality of times at predetermined intervals; detecting an electron signal secondarily generated from the sample surface by the electron beam; imaging an electron signal detected by the previously specified n-th or later electron beam irradiation; and measuring the resistance or a leakage amount of the defective portion of the sample surface in accordance with the degree of charge relaxation by monitoring the charge relaxation state of the sample surface based on the electron beam image information.